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SNE-3200M
Cost effective Table-top SEM with various functions
For more details, visit SNE-3200M
Performance
| 15nm | 60.000X | SE/BSE Image |
Entry-level Table-top SEM with 15nm resolution & 60,000x magnification
Able to use for quality control, R&D and education purpose with various detectors which create surface information images (SE), and material informaiton images (BSE)
Compare: SNE-4500M Plus
SE (Secondary Electron)
- Create images with the height level information. Mostly used for surface inspection
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Bề mặt pin được kiểm tra dưới kính hiển vi điện tử quét SEM[/caption]
BSE (Back Scatted Electron)
-Create images with material information(Elements)
Convenience
| Stage System X,Y,R (3-axis) Beam Shift: 150μm |
Auto Setting Focus, Contrast, Brightness |
Simple S/W Convenient Operation |
Convenient stage movement by 3-axis and able to operate easily and conveniently with mouse control in U.I
Able to get various analysis results with various scan modes measurement tool
Specification
| Resolution | 15nm (30kV, SE Image) |
| 20nm (30kV, BSE Image) | |
| Magnification | 20x~60,000x |
| Accelerating Voltage | 1~30kV (1/5/10/15/20/30) |
| Detector | Secondary Electron Image(SE) |
| Backscattered Electron Image(BSE) | |
| Electron Gun | Pre-centered Tungsten Filament Cartridge |
| Stage Traverse | 3-axis System (X, Y, R, Z, T – Manual) |
| X, Y-axis : 35mm / R-axis : 360° | |
| * Image Shift : ±150μm | |
| * CCD Camera installed in the Chamber | |
| * T-axis : 0 to 45˚ (Option) | |
| Max. Sample Size | 70mm in Diameter x 30mm in Height |
| Automation Function | Auto Start, Auto Focus, |
| Auto Stigmator, Auto Contrast & Brightness | |
| Image Format | BMP, JPEG, PNG, TIFF |
| Vacuum Mode | High & Low Vacuum |
| Vacuum Pump | Rotary Pump / Turbo Molecular Pump (Full Automation) |
| Main Unit | 390(W)x380(D)x560(H)mm, 83kg |
| Controller Unit | 390(W)x325(D)x560(H)mm, 37kg |
| Rotary Pump | 400(W)x160(D)x340(H)mm, 24kg |
Beside these, SNE-3000MS contains EDS system from Bruker Detector. And to improve the result images, it is also optioned with IO sputter device. The sputter device can make the sample surface more rough to spit out more electron.
